Active device array substrate, color filter substrate and manufacturing methods thereof

ABSTRACT

An active device array substrate comprising a substrate, a pixel array, a partition configuration and an alignment material layer is provided. The substrate has an alignment region and a predetermined sealing region. The predetermined sealing region surrounds the alignment region. The pixel array is disposed on the substrate within the alignment region. The partition configuration is disposed on the substrate between the predetermined sealing region and the alignment region. The alignment material layer is disposed within the alignment region and covers the pixel array.

CROSS-REFERENCE TO RELATED APPLICATION

This application claims the priority benefit of Taiwan applicationserial no. 95114669, filed Apr. 25, 2006. All disclosure of the Taiwanapplication is incorporated herein by reference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to an active device array substrate, acolor filter substrate and manufacturing methods thereof. Moreparticularly, the present invention relates to an active device arraysubstrate and a color filter substrate each having a partitionconfiguration and methods of manufacturing the active device arraysubstrate and the color filter substrate each having a partitionconfiguration.

2. Description of Related Art

The popularity of multimedia in our society came as a result of therapid advancement in the fabrication of semiconductor devices anddisplay apparatuses. In particular, liquid crystal displays, with theadvantages of high displaying quality, good spatial utilization, lowpower consumption, radiation-free operation, have gradually become oneof the mainstream products in the market. Typically, each liquid crystaldisplay panel mainly includes two substrates and a liquid crystal layerdisposed between the two substrates. In general, each of the twosubstrates includes an alignment layer whether the display is an activematrix liquid crystal display or a passive matrix liquid crystaldisplay. The main function of the alignment layer is to align the liquidcrystal molecules in a specific configuration between the twosubstrates.

The method of fabricating the alignment layer includes forming analignment material layer on a thin film transistor array substrate or acolor filter substrate after the fabrication of the thin film transistorarray substrate or the color filter substrate. Then, an alignmenttreatment is performed through a rubbing process. For a substrate with asmall dimension, the polyimide (PI) coating technique is normally usedto transfer the alignment material layer to the surface of thesubstrate. However, as the dimension of a substrate increases, thecoating technique can no longer produce an alignment material layer witha high degree of film surface accuracy. Therefore, an ink-jet techniquehas been developed to resolve the problem of film surface inaccuracy. Inthe ink-jet technique, alignment material is sprayed onto the surface ofthe substrate. The alignment material layer is formed after thealignment material is diffused and cured.

In the process of using the ink-jet printing method to form thealignment material layer, part of the alignment material layer may coverthe common paste due to the difficulty of controlling the diffusion ofalignment material near the edges. Therefore, after assembling the colorfilter substrate or the active device array substrate having analignment material layer formed by the ink-jet printing method with acounter substrate to form a liquid crystal display panel, the commonpaste on the color filter substrate or the active device array substratemay form a poor electrically contact with the corresponding common pasteon the counter substrate. Ultimately, the displaying quality of theliquid crystal display panel is affected.

SUMMARY OF THE INVENTION

Accordingly, one objective of the present invention is to provide anactive device array substrate capable of improving the displayingquality of a liquid crystal display panel.

Another objective of the present invention is to provide a color filtersubstrate capable of improving the displaying quality of a liquidcrystal display panel.

Still another objective of the present invention is to provide a methodof fabricating an active device array substrate capable of controllingthe region for forming an alignment material layer.

Still yet another objective of the present invention is to provide amethod of fabricating a color filter substrate capable of controllingthe region for forming an alignment material layer.

To achieve these and other objects and in accordance with the purpose ofthe invention, as embodied and broadly described herein, the inventionprovides an active device array substrate. The active device arraysubstrate includes a substrate, a pixel array, a partition configurationand an alignment material layer. The substrate has an alignment regionand a predetermined sealing region. The predetermined sealing regionsurrounds the alignment region. The pixel array is disposed on thesubstrate within the alignment region. The partition configuration isdisposed on the substrate between the predetermined sealing region andthe alignment region. The alignment material layer is disposed withinthe alignment region and covers the pixel array.

According to one embodiment of the present invention, the foregoingactive device array substrate further includes an insulation layerdisposed on the substrate and extending from the alignment region to thepredetermined sealing region. Furthermore, the insulation layer coversthe scan lines, the data lines and the active devices.

According to one embodiment of the present invention, in the foregoingactive device array substrate, the partition configuration is a concavestructure having a width between about 10 μm to 3000 μm and has a depthdefined according to the thickness of the insulation layer.

According to one embodiment of the present invention, in the foregoingactive device array substrate, the foregoing partition configuration hasa depth between about 100 Å to 3000 Å.

According to one embodiment of the present invention, in the foregoingactive device array substrate, the partition configuration is a convexstructure having a width between about 10 μm to 3000 μm and a heightbetween about 1.5 μm to 4.5 μm.

According to one embodiment of the present invention, the foregoingactive device array substrate further includes at least one commonpaste. The common paste is disposed on the substrate outside thepredetermined sealing region and is electrically connected to the pixelarray.

According to one embodiment of the present invention, the shortestdistance between the foregoing common paste and the predeterminedsealing region is greater than or equal to 3000 μm.

According to one embodiment of the present invention, in the foregoingactive device array substrate, the pixel array further includes aplurality of scan lines, a plurality of data lines and a plurality ofpixel units. Each of the pixel units is electrically connected to one ofthe scan lines and one of the data lines. Furthermore, each of the pixelunits includes an active device and a pixel electrode. The active deviceis electrically connected to the corresponding scan line and data line.The pixel electrode is electrically connected to the active device.

The present invention also provides a color filter substrate. The colorfilter substrate includes a substrate, a color filter array, a partitionconfiguration and an alignment material layer. The substrate has analignment region and a predetermined sealing region. The predeterminedsealing region surrounds the alignment region. The color filter array isdisposed on the substrate within the alignment region. The partitionconfiguration is disposed on the substrate between the predeterminedsealing region and the alignment region. The alignment material layer isdisposed inside the alignment region to cover the color filter array.

According to one embodiment of the present invention, in the foregoingcolor filter substrate, the partition configuration is a convexstructure having a width between about 10 μm and 3000 μm and a heightbetween about 1.5 μm and 4.5 μm.

According to the foregoing color filter substrate in one embodiment ofthe present invention, the partition configuration is a concavestructure.

According to one embodiment of the present invention, the color filtersubstrate further includes at least one common paste. The common pasteis disposed on the substrate outside the predetermined sealing region.

According to one embodiment of the present invention, the shortestdistance between the foregoing common paste and the predeterminedsealing region is greater than or equal to 3000 μm.

According to one embodiment of the present invention, the foregoingcolor filter array includes a black matrix layer, a plurality of colorfilter patterns and a common electrode layer. The color filter patternsare disposed between the patterns of the black matrix layer. The commonelectrode covers the black matrix layer and the color filter patternsand is electrically connected to the common paste.

According to one embodiment of the present invention, the materialconstituting the foregoing partition configuration is identical to thatof the black matrix layer.

The present invention also provides a method of fabricating an activedevice array substrate. The method of fabricating the active devicearray substrate includes the following steps. First, a substrate isprovided. The substrate has an alignment region and a predeterminedsealing region. The predetermined sealing region surrounds the alignmentregion. Then, a pixel array is formed on the substrate within thealignment region and a partition configuration is formed between thealignment region and the predetermined sealing region. Afterwards, a jetink printing process is performed so that an alignment material layer isformed over the substrate within the alignment region to cover the pixelarray.

According to one embodiment of the present invention, in the method offabricating an active device array substrate, the formation of the pixelarray and the partition configuration includes forming a plurality ofscan lines, a plurality of data lines and a plurality of active deviceson the substrate within the alignment region. Then, an insulation layeris formed over the substrate to cover the scan lines, the data lines andthe active devices. A plurality of contact openings and theaforementioned partition configuration are formed in the insulationlayer. Subsequently, a plurality of pixel electrodes are formed on theinsulation layer. Each of the pixel electrodes is electrically connectedto one of the active devices through one of the contact openings.

According to one embodiment of the present invention, the contactopenings and the partition configuration in the foregoing insulationlayer are formed simultaneously.

According to one embodiment of the present invention, the method offabricating the active device array substrate further includes formingat least one common paste on the substrate outside the predeterminedsealing region, and the partition configuration is formed between thecommon paste and the alignment region.

The present invention also provides a method of fabricating a colorfilter substrate. The method of fabricating the color filter substrateincludes the following steps. First, a substrate is provided. Thesubstrate has an alignment region and a predetermined sealing region.The predetermined sealing region surrounds the alignment region. Then, acolor filter array is formed on the substrate within the alignmentregion and a partition configuration is formed between the alignmentregion and the predetermined sealing region. Afterwards, an ink-jetprinting process is performed so that an alignment material layer isformed over the substrate within the alignment region to cover the colorfilter array.

According to one embodiment of the present invention, in the method offabricating the color filter substrate, the formation of the colorfilter array and the partition configuration includes forming a blackmatrix layer on the substrate within the alignment region and forming apartition configuration between the alignment region and thepredetermined sealing region. After that, a plurality of color filterpatterns are formed between the patterns of the black matrix layer.Next, a common electrode layer is formed over the substrate to cover theblack matrix layer and the color filter patterns.

According to one embodiment of the present invention, the foregoingblack matrix layer and the partition configuration are formedsimultaneously.

According to one embodiment of the present invention, in the method offabricating the color filter substrate, the formation of the colorfilter array and the partition configuration includes forming a blackmatrix layer on the substrate within the alignment region. Then, aplurality of color filter patterns are formed between the patterns ofthe black matrix layer and a partition configuration is formed betweenthe alignment region and the predetermined sealing region. After that, acommon electrode layer is formed over the substrate to cover the blackmatrix layer and the color filter patterns.

According to one embodiment of the present invention, the method offabricating the color filter substrate further includes forming at leastone common paste on the substrate outside the predetermined sealingregion, so that the partition configuration is formed between the commonpaste and the alignment region.

In the active device array substrate or color filter substrate,according to one embodiment of the present invention, the partitionconfiguration restricts the region for forming the alignment materiallayer so that the alignment material layer does not cover the commonpaste. After assembling the active device array substrate or the colorfilter substrate with a counter substrate to form a liquid crystaldisplay panel, the circuit on the active device array substrate or colorfilter substrate can electrically conduct with the circuit on thecounter substrate through the common paste. Therefore, the liquidcrystal display panel has better displaying quality. In other words, theactive device array substrate or color filter substrate is able toimprove the displaying quality of the liquid crystal display panel. Inaddition, the method of fabricating the active device array substrate orthe method of fabricating the color filter substrate according to thepresent invention also includes the fabrication of a partitionconfiguration. Through the partition configuration, the region forforming the alignment material layer is controlled to prevent thealignment material layer from covering the common paste.

It is to be understood that both the foregoing general description andthe following detailed description are exemplary, and are intended toprovide further explanation of the invention as claimed.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings are included to provide a furtherunderstanding of the invention, and are incorporated in and constitute apart of this specification. The drawings illustrate embodiments of theinvention and, together with the description, serve to explain theprinciples of the invention.

FIG. 1A is a schematic cross-sectional view showing the structure of anactive device array substrate according to one embodiment of the presentinvention.

FIG. 1B is a top view of the active device array substrate in FIG. 1A.

FIGS. 2A and 2B are schematic local cross-sectional view and top view ofan active device array substrate according to a different embodiment ofthe present invention.

FIGS. 3A through 3F are schematic cross-sectional views showing thesteps for fabricating an active device array substrate according to oneembodiment of the present invention.

FIG. 4A is a schematic cross-sectional view showing the structure of acolor filter substrate according to one embodiment of the presentinvention.

FIG. 4B is a top view of the color filter substrate in FIG. 4A.

FIGS. 5A and 5B are schematic local cross-sectional view and top view ofa color filter substrate according to a different embodiment of thepresent invention.

FIGS. 6A through 6E are schematic cross-sectional views showing thesteps for fabricating a color filter substrate according to oneembodiment of the present invention.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

Reference will now be made in detail to the present preferredembodiments of the invention, examples of which are illustrated in theaccompanying drawings. Wherever possible, the same reference numbers areused in the drawings and the description to refer to the same or likeparts.

FIG. 1A is a schematic cross-sectional view showing the structure of anactive device array substrate according to one embodiment of the presentinvention. FIG. 1B is a top view of the active device array substrate inFIG. 1A. In fact, FIG. 1A is a cross-sectional view along line A-A′ ofFIG. 1B. As shown in FIGS. 1A and 1B, the active device array substrate100 includes a substrate 110, a pixel array 120, a partitionconfiguration 130 and an alignment material layer 140. The substrate 110is, for example, a glass substrate, a quartz substrate, or othersubstrate made of a suitable material. The substrate 110 has analignment region 110 a and a predetermined sealing region 110 b. Thepredetermined sealing region 110 b surrounds the alignment region 110 a.The pixel array 120 is disposed on the substrate 110 within thealignment region 110 a. The partition configuration 130 is disposed onthe substrate 110 between the predetermined sealing region 110 b and thealignment region 110 a. The alignment material layer 140 is disposedwithin the alignment region 110 a to cover the pixel array 120.

As shown in FIG. 1B, the pixel array 120 includes a plurality of scanlines 122, a plurality of data lines 124 and a plurality of pixel units126. Each of the pixel units 126 is electrically connected to one of thescan lines 122 and one of the data lines 124. Furthermore, each of thepixel units 126 includes an active device 126 a and a pixel electrode126 b. The active device 126 a is electrically connected to thecorresponding scan line 122 and data line 124. The pixel electrode 126 bis electrically connected to the active device 126 a.

The scan lines 122 are conductive lines fabricated using aluminum alloyor other suitable conductive material, for example. The data lines 124are conductive lines fabricated using chromium, aluminum alloy or othersuitable conductive material, for example. The active devices 126 a are,for example, thin film transistors or other three-terminal switchingdevices. The pixel electrodes 126 b are, for example, transmissiveelectrodes, reflective electrodes or transflective electrodes. Thematerial constituting the pixel electrodes 120 b includes indium tinoxide (ITO), indium zinc oxide (IZO), metals, or other transparent ornon-transparent conductive materials.

In the present embodiment as shown in FIG. 1A, the active device arraysubstrate 100 further includes an insulation layer 128. The insulationlayer 128 is disposed on the substrate 110 and extends from thealignment region 110 a to the predetermined sealing region 110 b. Theinsulation layer 128 covers the scan lines 122, the data lines 124 andthe active devices 126 a. In addition, the partition configuration 130in FIG. 1A is a concave structure. The partition configuration 130 has awidth between about 10 μm and 3000 μm and a depth defined according tothe depth of the insulation layer 128. The depth of the partitionconfiguration 130 is, for example, between 100 Å and 3000 Å. It is notedthat the partition configuration 130 is not limited to a concavestructure. FIG. 2A is a local cross-sectional view of an active devicearray substrate 100′ according to another embodiment of the presentinvention. As shown in FIG. 2A, the partition configuration 130′ is aconvex structure having a width between 10 μm and 3000 μm and a heightbetween 1.5μ and 4.5 μm, for example.

In addition, the active device array substrate 100 further includes atleast one common paste 150. The common paste 150 is disposed on thesubstrate 110 outside the predetermined sealing region 110 b and iselectrically connected to the pixel array 120. The material constitutingthe common paste 150 includes, for example, aluminum alloy or othersuitable conductive materials. The shortest distance between the commonpaste 150 and the predetermined sealing region 110 b is, for example,greater than or equal to 3000 μm. It should be noted that the pattern ofthe partition configuration 130 is not limited to a rectangular shapeand does not have to surround the alignment region 110 a. FIG. 2B is atop view of an active device array substrate 100″ according to anotherembodiment of the present invention. As shown in FIG. 2B, the partitionconfiguration 130″ is disposed in various locations between the commonpaste 150 and the alignment region 110 a without completely surroundingthe alignment region 110 a.

It should be noted that the alignment material layer 140 is fabricatedby performing an ink-jet printing process, for example. After thealignment material sprayed onto the alignment region 110 a of thesubstrate 110 is diffused and cured, the alignment material layer 140 isformed. Because the partition configuration 130 is capable of blockingthe spread of the alignment material and preventing the alignmentmaterial from diffusing into the predetermined sealing region 110 b, thealignment material layer 140 will not cover the common paste 150. Whenthe active device array substrate 100 is assembled into a liquid crystaldisplay panel (not shown), the common paste 150 may conduct with thecommon electrode of the color filter substrate (not shown) throughsilver paste (not shown), thereby providing a better displaying quality.In other words, the active device array substrate 100 can improve thedisplaying quality of the liquid crystal display panel. In thefollowing, a method of fabricating an active device array substrate isprovided.

FIGS. 3A through 3F are schematic cross-sectional views showing thesteps for fabricating an active device array substrate, according to oneembodiment of the present invention. To provide a better explanation ofthe process of fabricating the active device array substrate, some ofthe figures have both the cross-sectional view and the top view shown atthe same time. First, as shown in FIG. 3A, the method of fabricating theactive device array substrate includes providing a substrate 110. Thesubstrate 110 has an alignment region 110 a and a predetermined sealingregion 110 b. The predetermined sealing region 110 b surrounds thealignment region 110 a.

Then, a pixel array 120 is formed on the substrate 110 within thealignment region 110 a and a partition configuration 130 is formedbetween the alignment region 110 a and the predetermined sealing region110 b. As shown in FIG. 3B, the process of forming the pixel array 120and the partition configuration 130 includes forming a plurality of scanlines 122, a plurality of data lines 124 and a plurality of activedevices 126 a on the substrate 110 within the alignment region 110 a andforming at least one common paste 150 on the substrate 110 outside thepredetermined sealing region 110 b simultaneously. The formation of thescan lines 122, the data lines 124, the active devices 126 a and thecommon paste 150 includes, for example, performing a number of thin filmprocesses, photolithography processes and etching processes. Since thethin film processes, the photolithography processes and the etchingprocesses are conventional techniques, a detailed description of them isomitted.

As shown in FIG. 3C, an insulation layer 128 is formed on the substrate110 to cover the scan lines 122, the data lines 124 and the activedevices 126 a. The insulation layer is a planarization layer formed, forexample, by coating an organic material layer on the substrate 110.

In FIG. 3D, FIG. 3D(b) is a top view of the active device arraysubstrate and FIG. 3D(a) is a cross-sectional view along C-C′ and D-D′of FIG. 3D(b). As shown in FIG. 3D, a plurality of contact openings Hand a partition configuration 130 are formed in the insulation layer128. The partition configuration 130 is formed between the common paste150 and the alignment region 110 a. The formation of the contactopenings H and the partition configuration 130 includes performing aphotolithography process and an etching process. In the presentembodiment, the contact openings H and the partition configuration 130are formed simultaneously.

In FIG. 3E, FIG. 3E(b) is a top view of the active device arraysubstrate and FIG. 3E(a) is a cross-sectional view along E-E′ of FIG.3E(b). As shown in FIG. 3E, a plurality of pixel electrodes 126 b areformed on the insulation layer 128. Each of the pixel electrodes 126 bis electrically connected to one of the active devices 126 a through oneof the contact openings H. Each active device 126 a and its pixelelectrode 126 b together form a pixel unit 126. The scan lines 122, thedata lines 124 and the pixel units 126 together form the pixel array120. Furthermore, the formation of the pixel electrodes 126 b includes,for example, performing a thin film process, a photolithography processand an etching process.

As shown in FIG. 3F, an ink-jet printing process is performed to form analignment material layer 140 over the substrate 110 within the alignmentregion 110 a to cover the pixel array 120. The method includes, forexample, spraying the alignment material over the substrate 110 insidethe alignment region 110 a. After the alignment material has diffusedand cured, an alignment material layer 140 is formed.

After completing the foregoing steps, the active device array substrate100 is formed. It should be noted that the partition configuration 130is capable of stopping the spread of the alignment material when formingthe alignment material layer 140 so that the alignment material will notdiffuse to the predetermined sealing region 110 b. Hence, the alignmentmaterial layer 140 will not cover the common paste 150. In other words,the method of fabricating the active device array substrate 100 in thepresent invention can control the region in which the alignment materiallayer 140 is formed.

The foregoing active device array substrate 100 and a color filtersubstrate (not shown) may be assembled together to form a liquid crystaldisplay panel (not shown). The common paste 150 may conduct with acommon electrode of the color filter substrate through silver paste (notshown) so that the liquid crystal display panel can have an improveddisplaying quality.

FIG. 4A is a schematic cross-sectional view showing the structure of acolor filter substrate according to one embodiment of the presentinvention. FIG. 4B is a top view of the color filter substrate in FIG.4A. In fact, the color filter substrate in FIG. 4A is a schematiccross-sectional view along line F-F′ of FIG. 4B. As shown in FIGS. 4Aand 4B, the color filter substrate 200 includes a substrate 210, a colorfilter array 220, a partition configuration 230 and an alignmentmaterial layer 240. The substrate 210 is, for example, a glasssubstrate, a quartz substrate, or a substrate fabricated using othersuitable materials. The substrate 210 has an alignment region 210 a anda predetermined sealing region 210 b. The predetermined sealing region210 b surrounds the alignment region 210 a. The color filter array 220is disposed on the substrate 210 within the alignment region 210 a. Thepartition configuration 230 is disposed on the substrate 210 between thepredetermined sealing region 210 b and the alignment region 210 a. Thealignment material layer 240 is disposed within the alignment region 210a to cover the color filter array 220.

In the present embodiment, the color filter substrate 200 furtherincludes at least one common paste 250. The common paste 250 is disposedon the substrate 210 outside the predetermined sealing region 210 b. Thematerial constituting the common paste 250 includes, for example, indiumtin oxide, indium zinc oxide, metals or other transparent ornon-transparent conductive materials. In addition, the shortest distancebetween the common paste 250 and the predetermined sealing region 210 bis greater than or equal to 3000 μm. It should be noted that the patternof the partition configuration 230 is not limited to a rectangular shapeand does not have to completely surround the alignment region 210 a.FIG. 5A is a top view of a color filter substrate 200′ according toanother embodiment of the present invention. As shown in FIG. 5A, thepartition configuration 230′ is disposed in various locations betweenthe common paste 250 and the alignment region 210 a without completelysurrounding the alignment region 210 a.

More specifically, the color filter array 220 includes a black matrixlayer 222, a plurality of color filter patterns 224 and a commonelectrode layer 226. The color filter patterns 224 are disposed betweenthe patterns of the black matrix layer 222. The common electrode layer226 covers the black matrix layer 222 and the color filter patterns 224and is electrically connected to the common paste 250. The materialconstituting the black matrix layer 222 includes, for example, blackresin or other suitable materials. The color filter patterns 224include, for example, red filter patterns, green filter patterns andblue filter patterns. The material constituting the common electrodelayer 226 includes, for example, indium tin oxide, indium zinc oxide, orother transparent conductive material. The material constituting thepartition configuration 230 may be identical to that of the black matrixlayer 222.

In the present embodiment, the partition configuration 230 is a convexstructure having a width between about 10 μm and 3000 μm and a heightbetween about 1.5 μm and 4.5 μm. However, the partition configuration230 is not limited to a convex structure. FIG. 5B is schematic localcross-sectional view of a color filter substrate according to anotherembodiment of the present invention. As shown in FIG. 5B, the partitionconfiguration 230″ has a concave structure.

In a similar way to the aforementioned active device array substrate100, the partition configuration 230 can be used to stop the spread ofthe alignment material when an ink-jet printing process is performed toform the alignment material layer 240. Hence, the alignment materiallayer 240 is formed within the alignment region 210 a and the alignmentmaterial layer 240 will not cover the common paste 250. When the colorfilter substrate 200 is assembled into a liquid crystal display panel(not shown), the common paste 250 may electrically conduct with thepixel array on the active device array substrate (not shown) through thesilver paste, thereby improving the displaying quality of the liquidcrystal display panel. In other words, the color filter substrate 200can improve the displaying quality of the liquid crystal display panel.In the following, the method of fabricating the color filter substrateis explained.

FIGS. 6A through 6E are schematic cross-sectional views showing thesteps for fabricating a color filter substrate according to oneembodiment of the present invention. To provide a better explanation ofthe process of fabricating the color filter substrate, some of thefigures have both the cross-sectional view and the top view shown at thesame time. The method of forming the color filter substrate includes thefollowing steps. First, as shown in FIG. 6A, a substrate 210 isprovided. The substrate 210 has an alignment region 210 a and apredetermined sealing region 210 b. The predetermined sealing region 210b surrounds the alignment region 210 a.

Next, a color filter array 220 is formed on the substrate 210 within thealignment region 210 a and a partition configuration 230 is formedbetween the alignment region 210 a and the predetermined sealing region210 b. As shown in FIG. 6B, the formation of the color filter array 220and the partition configuration 230 includes forming a black matrixlayer 222 on the substrate 210 inside the alignment region 210 a and apartition configuration 230 between the alignment region 210 a and thepredetermined sealing region 210 b. It should be noted that, in thepresent embodiment, the black matrix layer 222 and the partitionconfiguration 230 are fabricated using an identical material and formedsimultaneously. The formation of the black matrix layer 222 and thepartition configuration 230 simultaneously includes coating a layer ofphotosensitive resin over the substrate 210 and then using a half-tonemask to perform an exposure. Afterward, the exposed photosensitive resinis developed to form the black matrix layer 222 and the partitionconfiguration 230 simultaneously.

As shown in FIG. 6C, a plurality of color filter patterns 224 are formedbetween the patterns of the black matrix layer 222.

As shown in FIG. 6D, a common electrode layer 226 is formed over thesubstrate 210 to cover the black matrix layer 222 and the color filterpatterns 224 and form at least one common paste 250 on the substrate 210outside the predetermined sealing region 210 b. In other words, thepartition configuration 230 is located between the common paste 250 andthe alignment region 210 a. The common electrode layer 226, the blackmatrix layer 222 and the color filter patterns 224 together form a colorfilter array 220.

As shown in FIG. 6E, an ink-jet printing process is performed to form analignment material layer 240 over the substrate 210 within the alignmentregion 210 a such that the color filter array 220 is also covered. Theformation of the alignment material layer 240 includes sprayingalignment material into the alignment region 210 a of the substrate 210.After diffusing and curing the alignment material, the alignmentmaterial layer 240 is formed.

After completing the foregoing steps, the color filter substrate 200 isformed. It should be noted that the partition configuration 230 iscapable of stopping the spread of the alignment material when formingthe alignment material layer 240 so that the alignment material will notdiffuse to the predetermined sealing region 210 b. Hence, the alignmentmaterial layer 240 will not cover the common paste 250. In other words,the method of fabricating the color filter array substrate 200 in thepresent invention can control the region in which the alignment materiallayer 240 is formed. Furthermore, the color filter substrate 200 and anactive array substrate (not shown) may be assembled to form a liquidcrystal display panel (not shown). The common paste 250 conducts withthe common electrode on the active device array substrate through silverpaste (not shown) so that the displaying quality of the liquid crystaldisplay panel is improved.

Although the black matrix layer 222 and the partition configuration 230are simultaneously formed in the present embodiment, it is not necessaryto form the partition configuration and the black matrix layer 222 atthe same time. Moreover, the material constituting the partitionconfiguration 230 need not be identical to the one constituting theblack matrix layer 222. In another embodiment, the partitionconfiguration 230 and the color filter patterns 224 are formedsimultaneously and the material constituting the partition configuration230 may be identical to the one constituting the color filter patterns224.

In summary, the fabricating method of the active device array substrateand the color filter substrate according to the present invention has atleast the following advantages:

1. In the active device array substrate and the color filter substrateof the present invention, the partition configuration restricts theregion in which the alignment material is formed so that the alignmentmaterial layer will not cover the common paste. When the active devicearray substrate or the color filter substrate is assembled into a liquidcrystal display panel with a counter substrate, the circuits on the twosubstrates electrically conduct through the common paste and provide abetter displaying quality. Thus, the active device array substrate andcolor filter substrate can improve the displaying quality of the liquidcrystal display panel.

2. The method of fabricating the active device array substrate or themethod of fabricating the color filter substrate in the presentinvention includes the process of forming the partition configuration.The partition configuration prevents the alignment material layer fromcovering the common paste in the process of forming the alignmentmaterial layer.

3. The method of fabricating the active device array substrate or themethod of fabricating the color filter substrate in the presentinvention is compatible with existing manufacturing processes. Sinceonly the layout of one of the masks needs to be modified, no additionalequipment is required.

It will be apparent to those skilled in the art that variousmodifications and variations can be made to the structure of the presentinvention without departing from the scope or spirit of the invention.In view of the foregoing, it is intended that the present inventioncovers modifications and variations thereof, provided they fall withinthe scope of the following claims.

1. An active device array substrate, comprising: a substrate having analignment region and a predetermined sealing region, wherein thepredetermined sealing region surrounds the alignment region; a pixelarray disposed on the substrate within the alignment region; a partitionconfiguration disposed on the substrate, wherein the partitionconfiguration is located between the predetermined sealing region andthe alignment region; and an alignment material layer disposed insidethe alignment region to cover the pixel array.
 2. The active devicearray substrate of claim 1, further comprising an insulation layerdisposed over the substrate and extending from the alignment region tothe predetermined sealing region such that the insulation layer coversthe pixel array.
 3. The active device array substrate of claim 2,wherein the partition configuration is a concave structure having awidth between about 10 μm and 3000 μm and a depth defined by thethickness of the insulation layer.
 4. The active device array substrateof claim 3, wherein the partition configuration has a depth betweenabout 100 Å and 3000 Å.
 5. The active device array substrate of claim 1,wherein the partition configuration is a convex structure having a widthbetween about 10 μm and 3000 μm and a height between about 1.5 μm and4.5 μm.
 6. The active device array substrate of claim 1, furthercomprising at least one common paste disposed on the substrate outsidethe predetermined sealing region and electrically connected to the pixelarray.
 7. The active device array substrate of claim 6, wherein theshortest distance between the common paste and the predetermined sealingregion is greater than or equal to 3000 μm.
 8. The active device arraysubstrate of claim 1, wherein the pixel array comprises: a plurality ofscan lines; a plurality of data lines; a plurality of pixel unitselectrically connected to one of the scan lines and one of the datalines, each of the pixel units including: an active device electricallyconnected to the corresponding scan line and data line; and a pixelelectrode electrically connected to the active device.
 9. A color filtersubstrate, comprising: a substrate having an alignment region and apredetermined sealing region, wherein the predetermined sealing regionsurrounds the alignment region; a color filter array disposed on thesubstrate within the alignment region; a partition configurationdisposed on the substrate, wherein the partition configuration islocated between the predetermined sealing region and the alignmentregion; and an alignment material layer disposed inside the alignmentregion to cover the color filter array.
 10. The color filter substrateof claim 9, wherein the partition configuration is a convex structurehaving a width between about 10 μm and 3000 μm and a height betweenabout 1.5 μm and 4.5 μm.
 11. The color filter substrate of claim 9,wherein the partition configuration is a concave structure.
 12. Thecolor filter substrate of claim 9, further comprising at least onecommon paste disposed on the substrate outside the predetermined sealingregion.
 13. The color filter substrate of claim 12, wherein the shortestdistance between the common paste and the predetermined sealing regionis greater than or equal to 3000 μm.
 14. The color filter substrate ofclaim 12, wherein the color filter array further comprises: a blackmatrix layer; a plurality of color filter patterns disposed betweenpatterns of the black matrix layer; and a common electrode layercovering the black matrix layer and the color filter patterns, whereinthe common paste is electrically connected to the common electrodelayer.
 15. The color filter substrate of claim 14, wherein the materialconstituting the partition configuration and the black matrix layer areidentical.
 16. A method of fabricating an active device array substrate,comprising: providing a substrate, wherein the substrate has analignment region and a predetermined sealing region, and thepredetermined sealing region surrounds the alignment region; forming apixel array on the substrate within the alignment region; forming apartition configuration between the alignment region and thepredetermined sealing region; and performing an ink-jet printing processto form an alignment material layer over the substrate within thealignment region so as to cover the pixel array.
 17. The method of claim16, wherein the step of forming the pixel array and the partitionconfiguration comprises: forming a plurality of scan lines, a pluralityof data lines and a plurality of active devices on the substrate withinthe alignment region; forming an insulation layer on the substrate tocover the scan lines, the data lines and the active devices; forming aplurality of contact openings and the partition configuration in theinsulation layer; and forming a plurality of pixel electrodes on theinsulation layer, wherein each of the pixel electrodes is electricallyconnected to one of the active devices through one of the contactopenings.
 18. The method of claim 17, wherein the contact openings andthe partition configuration in the insulation layer are formedsimultaneously.
 19. The method of claim 17, further comprising formingat least one common paste on the substrate outside the predeterminedsealing region, so that the partition configuration is formed betweenthe common paste and the alignment region.
 20. A method of fabricating acolor filter substrate, comprising: providing a substrate, wherein thesubstrate has an alignment region and a predetermined sealing region,and the predetermined sealing region surrounds the alignment region;forming a color filter array on the substrate within the alignmentregion and forming a partition configuration between the alignmentregion and the predetermined sealing region; and performing an ink-jetprinting process to form an alignment material layer over the substratewithin the alignment region so as to cover the color filter array. 21.The method of claim 20, wherein the step of forming the color filterarray and the partition configuration comprises: forming a black matrixlayer on the substrate within the alignment region and forming thepartition configuration between the alignment region and thepredetermined sealing region; forming a plurality of color filterpatterns between patterns of the black matrix layer; and forming acommon electrode layer over the substrate to cover the black matrixlayer and the color filter patterns.
 22. The method of claim 21, whereinthe black matrix layer and the partition configuration are formedsimultaneously.
 23. The method of claim 20, wherein the step of formingthe color filter array and the partition configuration comprises:forming a black matrix layer on the substrate within the alignmentregion; forming a plurality of color filter patterns between thepatterns of the black matrix layer and forming the partitionconfiguration between the alignment region and the predetermined sealingregion; and forming a common electrode layer over the substrate to coverthe black matrix layer and the color filter patterns.
 24. The method ofclaim 20, further comprising forming at least one common paste on thesubstrate outside the predetermined sealing region, so that thepartition configuration is formed between the common paste and thealignment region.